Skip to main navigation Skip to search Skip to main content

Tungsten work function engineering for dual metal gate nano-CMOS

  • J. K. Efavi
  • , T. Mollenhauer
  • , T. Wahlbrink
  • , H. D.B. Gottlob
  • , M. C. Lemme
  • , H. Kurz
  • AMO GmbH

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Tungsten work function engineering for dual metal gate nano-CMOS'. Together they form a unique fingerprint.
Sort by

Material Science