Abstract
We have investigated the effect of ZnO films used as buffer layers on the triboluminescence (TrL) intensity of ZnS:Mn thin films on quartz substrates using the RF magnetron sputtering method and annealing technique. Highly oriented ZnO film was first deposited on quartz glass substrate and then the ZnS:Mn film was successfully deposited on the highly oriented ZnO film. By annealing at 5% H2 in Ar ambient, the crystallinity of both ZnO and ZnS:Mn films was improved. It was found that the addition of the ZnO buffer layer greatly improves the TrL intensity of the ZnS:Mn films.
| Original language | English |
|---|---|
| Pages (from-to) | 5259-5261 |
| Number of pages | 3 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 41 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - Aug 2002 |
| Externally published | Yes |
Keywords
- Annealing
- Crystallinity
- Triboluminescence
- ZnO
- ZnS:Mn