Nanowire fin field effect transistors via UV-based nanoimprint lithography
- A. Fuchs
- , M. Bender
- , U. Plachetka
- , L. Kock
- , T. Wahlbrink
- , H. D.B. Gottlob
- , J. K. Efavi
- , M. Moeller
- , M. Schmidt
- , T. Mollenhauer
- , C. Moormann
- , M. C. Lemme
- , H. Kurz
- AMO GmbH
Research output: Contribution to journal › Article › peer-review
13
Citations
(Scopus)