Nanoscale TiN metal gate technology for CMOS integration

M. C. Lemme, J. K. Efavi, T. Mollenhauer, M. Schmidt, H. D.B. Gottlob, T. Wahlbrink, H. Kurz

Research output: Contribution to journalArticlepeer-review

35 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Nanoscale TiN metal gate technology for CMOS integration'. Together they form a unique fingerprint.

Engineering

Material Science