Nanoscale TiN metal gate technology for CMOS integration

  • M. C. Lemme
  • , J. K. Efavi
  • , T. Mollenhauer
  • , M. Schmidt
  • , H. D.B. Gottlob
  • , T. Wahlbrink
  • , H. Kurz

Research output: Contribution to journal › Article › peer-review

36 Citations (Scopus)

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Material Science