Highly selective etch process for silicon-on-insulator nano-devices
- T. Wahlbrink
- , T. Mollenhauer
- , Y. M. Georgiev
- , W. Henschel
- , J. K. Efavi
- , H. D.B. Gottlob
- , M. C. Lemme
- , H. Kurz
- , J. Niehusmann
- , P. Haring Bolivar
- AMO GmbH
- Institut für Halbleitertechnik, RWTH-Aachen
Research output: Contribution to journal › Conference article › peer-review
36
Citations
(Scopus)