CMOS integration of epitaxial Gd2O3 high-k gate dielectrics
- H. D.B. Gottlob
- , T. Echtermeyer
- , T. Mollenhauer
- , J. K. Efavi
- , M. Schmidt
- , T. Wahlbrink
- , M. C. Lemme
- , H. Kurz
- , M. Czernohorsky
- , E. Bugiel
- , H. J. Osten
- , A. Fissel
- AMO GmbH
- Leibniz University Hannover
Research output: Contribution to journal › Article › peer-review
45
Citations
(Scopus)